CVD System

Chemical Vapor Deposition

This page presents several photographs of our CVD system in action.

This page presents several photographs of our second CVD system, with three perspectives of our CVD system shown to the right. The system uses a Baratron capacitance gauge and a thermocouple vacuum gauge for monitoring the pressure. We have a variety of gas sources, monitored using flow meters and needle valves, attached to the system. The system also includes a tube furnace capable of reaching 1100 °C. The currently available gases include: methane, hydrogen, diborane, acetylene, ethylene, nitrogen and ammonia.

We use our system to grow epitaxial diamond films and carbon nanotubes.

Growing an epitaxial diamond film. The image to the right is a zoomed perspective of the growth chamber.

Here is an image of the CVD growth chamber setup to grow a diamond film.

RF Hydrogen plasma ignited in our plasma chamber

RF Hydrogen plasma ignited in our plasma chamber.