EBL uses SEM and E-beam writer for fabrication of a wide variety of devices. Research areas include: quantum structures, such as single electron transistors; optical structures, such as binary holograms and linear/circular gratings; electro-mechanical structures, such as Surface Acoustic Wave (SAW) and MEMS devices; as well as the testing of novel resists and ultra-small sensor fabrication.

Patterns support lines of the arbitrary slope, circles, circular arcs, and arbitrary filled polygons. Text, spline curves, and elliptical arcs can also be easily generated and written as a series of short lines with an almost unlimited number of exposure conditions. QCAD natively supports DXF and DWG formats. Examples of patterns can be found below.

Operation Manual